To operate an EUV-LDP-Source, media and processes must be regulated and controlled in real time. In order to evaluate the hardware and software used for this purpose, a simulator is not only helpful but also saves enormous costs since the real machine is not occupied. For our customer we have developed such a simulator.

LDP technology is based on rotating tin-coated electrodes, trigger lasers and pulsed electrical discharges to produce an EUV-emitting plasma with a repetition rate of up to 15 kHz.

The EUV-LDP-Source developed by us is able to map the processes with approx. 90% degree of reality. To achieve this high degree, the resonant charging had to be simulated by hardware circuits (PCBs).

#EUV_LDP #LASER #HIGH_Voltage #HIGH_VACUUM #SIEMENS_PLC #NI_CRIO